Atomic Force Microscope

Historically AFMs have proven themselves reliable instrument for determining relative sample dimensions but have struggled to provide accurate absolute dimensions of surface features. As the dimensions found in research and industrial applications become smaller and smaller, it is now more important than ever for AFMs to measure the absolute dimensions of surface features with accuracy and repeatability.

Park NX20 is equipped with unique features that make it easier to uncover the reasons behind device failure and develop more creative solutions. Its unparalleled precision provides high resolution data that lets you focus on your work, while its True Non-Contact™ mode scan keeps tips sharper and longer, so you won’t have to waste as much time and money replacing them

Park NX10 produces data you can trust, replicate, and publish at the highest nano resolution. From sample setting to full scan imaging, measurement, and analysis, Park NX10 saves you time every step of the way. With more time and better data, you can focus on doing more innovative research.

Park NX-HDM provides accurate sub-angstrom surface roughness measurements, scan after scan. Park NX-HDM, together with its industry’s lowest noise floor, and its unique True Non-Contact™ technology, it is the most accurate AFM for surface roughness measurement in the market.

Park XE7 has all the state-of-the-art technology you've come to expect from Park Systems, at a price your lab can afford. Designed with the same attention to detail as our more advanced models, the XE7 allows you to do your research on time and within budget.

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Park 3DM Series, the completely automated AFM system designed for overhang profiles, high-resolution sidewall imaging, and critical angle measurements. With the patented decoupled XY and Z scanning system with tilted Z-scanner, it overcomes the challenges of the normal and flare tip methods in accurate sidewall analysis. In utilizing our True Non-Contact Mode™, the Park 3DM Series enables non-destructive measurement of soft photoresist surfaces with high aspect ratio tips.